Photon Synthesis of Nanometric Films Based on Transitional Metal oxides for Multi-Parameter Sensors
AbstractThe reactive pulsed laser deposition (RPLD) based on a KrF laser was used for photon synthesis of nanometric iron and chromium oxides films. RPLD allows controlling the thickness and stoichiometry of deposits with definite band gap. So RPLD was used for synthesizing nanometric iron and chromium oxides films for thermo-photo-chemical sensors. We compared sensing properties of iron and chromium oxides nanometric films deposited on <100>Si substrate by RPLD. These iron and chromium oxides films have semiconductor properties with the band gaps less than 1.0 eV. The largest photosensitivity of iron and chromium oxides films was about 44 Vc/W and 2.5 Vc/W, accordingly, for white light at power density ~ 6x10-3 W/cm2. Vc is “chemical” photo e.m.f.. Maximum value of thermo electromotive force (e.m.f.) coefficient of iron and chromium oxides films was about 1.65 mV/K and 3.5-4.5mV/K, accordingly. Iron oxides films were tested as chemical sensors: the largest sensitivity of NO molecules was at the level of 7x1012 cm-3. Our results showed that nanometric iron and chromium oxides films synthesized by UV photons can be used as up-to-date materials for multi-parameter sensors operating at moderate temperature.
How to Cite
Mulenko, S., Luches, A., Caricato, A., & Valerini, D. (2012). Photon Synthesis of Nanometric Films Based on Transitional Metal oxides for Multi-Parameter Sensors. ALT Proceedings, 1. https://doi.org/10.12684/alt.1.55
Laser – matter interaction and processing technologies
Authors who publish with this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under the Creative Commons Attribution License (CC BY 3.0) that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgement of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See The Effect of Open Access).