Enhancement of the Raman Scattering and the Third-Harmonic Generation in Silicon Nanowires
AbstractWe studied features of Raman scattering and the third-harmonic generation in silicon nanowire (SiNW) ensembles formed by means of chemical etching of crystalline silicon (c-Si) wafers with preliminary deposited silver nanoparticles in hydrofluoric acid. The c-Si wafers of different crystallographic orientations and doping levels were used, which results in variations of the formed nanostructure size and degree of order. For the excitation at 1064 nm the ratio of Raman scattering signals for SiNWs and those for initial c-Si wafer ranges from 2 to 5, whereas for shorter wavelengths the ratio increases for more ordered arrays of SiNWs of greater diameter and decreases for less ordered SiNW structures. The TH signals in SiNW ensembles demonstrate both fall and one- or two-orders-of-magnitude rise in comparison with c-Si depending on the structure of the SiNW ensemble. The obtained results are explained by the effect of partial light localization in SiNW ensembles.
How to Cite
Golovan, L., Bunkov, K., Gonchar, K., Timoshenko, V., Osminkina, L., Petrov, D., Marshov, V., Sivakov, V., & Kulmas, M. (2012). Enhancement of the Raman Scattering and the Third-Harmonic Generation in Silicon Nanowires. ALT Proceedings, 1. https://doi.org/10.12684/alt.1.81
Laser diagnostics and spectroscopy
Authors who publish with this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under the Creative Commons Attribution License (CC BY 3.0) that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgement of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See The Effect of Open Access).